Method of on-press developing lithographic plates utilizing micr

Details Method of on-press developing lithographic plates utilizing micr Method of on-press developing lithographic plates utilizing micr

1993-11-01

1996-05-14

Leshes, George F.

Radiation imagery chemistry: process, composition, or product th

Microcapsule, process, composition, or product

430309, 430325, 430326, G03C 172

Patent

active

055166202

ABSTRACT:
A lithographic printing plate for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

REFERENCES:
patent: 3867150 (1975-02-01), Ketley
patent: 3892180 (1975-07-01), Monahan
patent: 4284696 (1981-08-01), Ishida et al.
patent: 4399209 (1983-08-01), Sanders et al.
patent: 4440846 (1984-04-01), Sanders et al.
patent: 4562137 (1985-12-01), Sanders
patent: 4636453 (1987-01-01), Keys et al.
patent: 4687725 (1987-08-01), Wright et al.
patent: 4782002 (1988-11-01), Makino et al.
patent: 4879201 (1989-11-01), Hasegawa
patent: 4884501 (1989-12-01), Izaki et al.
patent: 4904563 (1990-02-01), Aoai et al.
patent: 4910118 (1990-03-01), Adair et al.
patent: 4916041 (1990-04-01), Hasegawa et al.
patent: 4937159 (1990-06-01), Gottschalk et al.
patent: 4962009 (1990-10-01), Washizu et al.
patent: 4999273 (1991-03-01), Hasegawa
patent: 5045430 (1991-09-01), Shackle et al.
patent: 5230982 (1993-07-01), Davis et al.

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