Method of obtaining the distribution profile of electrically act

Optics: measuring and testing – With sample preparation

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324158R, 324158D, G01B 902, G01R 3126

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active

039763773

ABSTRACT:
A method of obtaining a distribution profile of electrically active ions, of one type conductivity, implanted into a semiconductor, of an opposite type conductivity, is carried out with the aid of an integral target of the semiconductor. The integral target is formed with a plurality of doped regions of different background impurity concentrations, respectively, therein. Each of the operations of annealing, angle-lapping, and staining the doped regions to determine P-N junction depths therein is carried out on all of the doped regions simultaneously. An enlarged photograph of the stained angle-lapped portions of the doped regions provides directly a histogram of the distribution profile.

REFERENCES:
patent: 3424532 (1969-01-01), Briggs et al.
Glendinning et al.; IEEE Trans on Parts, Materials, and Packaging; vol. PMP-6; No. 3; Sept. 1970, pp. 93-99.

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