Method of obtaining relatively aligned patterns on two opposite

Details Method of obtaining relatively aligned patterns on two opposite Method of obtaining relatively aligned patterns on two opposite

1988-12-12

1990-06-26

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430 5, 430311, G03F 900

Patent

active

049371622

ABSTRACT:
The invention relates to a method of obtaining relatively aligned patterns on two opposite surfaces of an opaque slice (2).
This can be realized in that the opaque slice (2) carrying a reference pattern (3) is glued on a transparent plate (1) on the side of the said pattern (3) and an alignment pattern (8) aligned with respect to the reference pattern (3) is transferred by photolithography to the plate (1). This alignment pattern (8) is used to form on the other surface of the opaque slice (2) the desired patterns (9) aligned with respect to the alignment pattern (8).

REFERENCES:
patent: 3963489 (1976-06-01), Cho

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