Method of obtaining hologram and an exposure apparatus

Optical: systems and elements – Holographic system or element – Having particular recording medium

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359 1, 359 9, 359 15, 359 35, 430 1, 430 2, 430321, 356347, G03H 102, G02B 532, G01B 9021

Patent

active

052913155

ABSTRACT:
A hologram exposure apparatus for and method of obtaining a hologram using a photoresist for an in-line type interferometer wherein a photoresist substrate is detachably mounted on a substrate rotating device. A concentric pattern of a hologram from a source of light is projected onto the photoresist on the substrate mounted on the substrate rotating device while rotating the substrate and moving a projecting device in a direction at right angles with the rotary shaft of the photoresist substrate.

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patent: 4025731 (1977-05-01), Rembault
patent: 4032343 (1977-06-01), Deml et al.
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patent: 4402571 (1983-09-01), Cowan et al.
patent: 4458345 (1984-07-01), Bjorklund et al.
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patent: 4895790 (1990-01-01), Swanson et al.
patent: 4936665 (1990-06-01), Whitney
patent: 5045438 (1991-09-01), Adachi
MacGovern, A. J. and Wyant, J. C. "Computer Generated Holograms for Testing Optical Elements" Applied Optics, Mar. 1971, vol. 10, No. 3 pp. 619-624 350-3.66.
L. d'Auria, et al., "Photolithographic Fabrication of Thin Film Lenses," Optics Communications, 5:4, Jul., 1972.

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