Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate
2006-08-01
2006-08-01
Lebentritt, Michael (Department: 2812)
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
Reexamination Certificate
active
07083992
ABSTRACT:
A method for observing defects in an amorphous material by transmission electron microscopy. The method generates an incident electron beam into the amorphous material, eliminates a generated diffraction wave to form an image only by a transmission wave coming through the amorphous material, and observes the image under an under-focus condition.
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Inoue Yasuhide
Mori Hirotaro
Ogawa Shin-ichi
Shimanuki Junichi
Lebentritt Michael
Matsushita Electric - Industrial Co., Ltd.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Stevenson Andre′
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