Method of monitoring metal ion content in plating baths

Details Method of monitoring metal ion content in plating baths Method of monitoring metal ion content in plating baths

1993-05-28

1994-03-29

Niebling, John

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

204412, 204434, 204DIG8, G01N 2726

Patent

active

052981312

ABSTRACT:
A method of monitoring in-tank and on-line metal ion content within a plating bath. The method involves the steps of applying a pretreatment signal to a sensing electrode positioned within the plating bath, applying a sweep signal to the pretreated sensing electrode, and measuring the voltammetric peak current of the resultant response signal. The voltammetric peak current is proportional to the metal ion content of the plating bath. The method complements and is easily integrated with known voltammetric techniques for analysis of trace and major constituents, and is thus an integral part of an efficient overall plating bath analysis system.

REFERENCES:
patent: 4631116 (1986-12-01), Ludwig
EG&G Princeton Applied Research, Application Note Plat-2, "Application of Polargraphy to the Plating Industry," 1985.*

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