Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1996-10-10
1998-08-04
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430302, 430311, 430330, 382145, G03C 500
Patent
active
057891249
ABSTRACT:
Direct detection of poisoning of chemically amplified and other lithographic resists by ambient gases is achieved in substantially real time and with extremely high sensitivity by making test exposures of the resist at different doses such as by a graded density feature. Sensitivity may be made unconditionally adequate to ensure that uniform and predictable by separating test exposures by a time interval in excess of the amount of time necessary for lithographic exposure of chip areas on a wafer. Sensitivity increase may also obtained, particularly in combination with time separation of test exposures, from the use of sub-resolution features for grading density of a test mask pattern feature which quantizes exposure sensitivity at high resolution. Measurement of test exposure patterns may be accomplished in an overlay optical metrology tools in the same process in which lithographic resist patterning is measured to reduce time and process steps. The onset of failure of gas treatment systems may be detected well in advance of the time such failure can cause unpredictable resist response to patterning exposure.
REFERENCES:
patent: 5240812 (1993-08-01), Conley et al.
patent: 5452052 (1995-09-01), Takado et al.
"Semiconductor Lithography Principles, Practices, and Materials"; Wayne M. Moreau; Microdevices; Physics and Fabrication Technologies.
"A Simple and Calibratable method for the Determination of Optimal Focus"; J. W. Gemmick; SPIE vol. 1088 Optical; 1989; pp. 222-226.
"Exposure Monitor Structure"; Alexander Starikov; IBM Corp.; Advanced Technology Center SPIE vol. 1261 integrated Circuit Metrology, Inspection, and Process Control IV (1990); pp. 315-324.
International Business Machines - Corporation
Mortinger Alison
Young Christopher G.
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