Method of monitoring fluid contamination

Details Method of monitoring fluid contamination Method of monitoring fluid contamination

1997-12-22

1998-12-15

Warden, Jill

Cleaning and liquid contact with solids

Processes

Hollow work, internal surface treatment

134 2, 134 221, 134 2211, 134 18, 134 26, 134 51R, 134113, 134902, 438 14, 438906, B08B 9093

Patent

active

058491031

ABSTRACT:
A method of monitoring contamination of fluid used to rinse crystal wafers, and a contamination monitoring system having a portable framework which carries a rinsing bath for detachable connection to a remote fluid source. A transport structure is mounted on the framework to accommodate transport of the system to and from the remote fluid source. The framework includes a chamber which encloses the rinsing bath to isolate it from the surrounding environment, typically using a filter which removes unwanted particles from air within the chamber. The filter also typically creates a vertical airflow within the chamber. In one embodiment, the system employs a rinsing bath with inner and outer tanks, the inner tank being configured to hold wafers to be rinsed and the outer tank being configured to hold the inner tank. An input port introduces fluid from the remote fluid source into the inner tank for overflow into the outer tank. The outer tank employs an output port for discharge of fluid received from the inner tank. The system identifies contaminated fluid using a test wafer which is cleansed within the rinsing bath and compared to a wafer having optimal characteristics. The source of contamination may be identified by connecting the rinsing bath to various outputs along the fluid path from the remote fluid source, which effectively allows the user to identify an affected fluid path segment.

REFERENCES:
patent: 4778532 (1988-10-01), McConnell et al.
patent: 4872356 (1989-10-01), Barnett et al.
patent: 5069235 (1991-12-01), Vetter et al.
patent: 5162233 (1992-11-01), Komori et al.
patent: 5647386 (1997-07-01), Kaiser
patent: 5656097 (1997-08-01), Olesen et al.

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