Method of monitoring accuracy with which patterns are written

Details Method of monitoring accuracy with which patterns are written Method of monitoring accuracy with which patterns are written

1992-01-21

1994-03-22

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

2504922, G01B 1100

Patent

active

052969177

ABSTRACT:
A method of monitoring the accuracy with which patterns are written includes the steps of: disposing in an exposure zone a monitor pattern zone for monitoring accuracy; partitioning the monitor pattern zone into a plurality of fields so that the fields overlap each other; forming checking patterns where the plurality of fields overlap each other; and measuring an alignment accuracy in the checking patterns by exposing the plurality of fields to an electron beam and inspecting the exposed field.

REFERENCES:
patent: 4774461 (1988-09-01), Matsui et al.
patent: 5017514 (1991-05-01), Nishimoto

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