Method of monitoring a photolithographic process through utiliza

Details Method of monitoring a photolithographic process through utiliza Method of monitoring a photolithographic process through utiliza

1997-09-15

1999-02-02

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430394, G03F 900

Patent

active

058662839

ABSTRACT:
A method of monitoring a photolithographic process whereby a test pattern (4) is imaged a number of times side by side with the same radiant energy on a photoresist layer (1) provided on a surface (2) of a substrate (3), but in a series of different irradiation times, after which the photoresist is developed. The irradiation dose or "energy-to-clear" with which the photoresist becomes just soluble in developer can thus be ascertained. The radiant energy with which the test pattern is imaged on the photoresist is only a fraction here of the radiant energy available in the process itself for imaging patterns on photoresist which is to be monitored. The method is thus suitable for monitoring a photolithographic process in which pulsed laser radiation is used for the pattern irradiation. The energy-to-clear can be accurately determined also in these processes.

REFERENCES:
patent: 5516605 (1996-05-01), Hwang
patent: 5567575 (1996-10-01), Hirama

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