Coating processes – Direct application of electrical – magnetic – wave – or... – Pretreatment of substrate or post-treatment of coated substrate
Reexamination Certificate
2005-04-12
2005-04-12
Padgett, Marianne (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Pretreatment of substrate or post-treatment of coated substrate
C427S552000, C427S510000, C427S497000, C438S515000, C438S694000, C438S766000, C438S795000
Reexamination Certificate
active
06878417
ABSTRACT:
A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. When the imprinted molecular patterns are conjugated chains containing π bonds along which electrical charge can flow the molecular patterns constitute molecular wires or the imprinted molecules constitute a molecular-scale device. The surface of the substrate can be doped by including n- or p-type dopants in the adsorbate molecules. These molecular wires are anchored to the substrate by using conjugated chains which can be chemically bound at intervals along the chains to the substrates.
REFERENCES:
patent: 4340617 (1982-07-01), Deutsch et al.
patent: 4566937 (1986-01-01), Pitts
patent: 4608117 (1986-08-01), Ehrlich et al.
patent: 4615904 (1986-10-01), Ehrlich et al.
patent: 4701347 (1987-10-01), Higashi
patent: 5035782 (1991-07-01), Tamura et al.
patent: 5112434 (1992-05-01), Goldberg
patent: 5273788 (1993-12-01), Yu
patent: 5279867 (1994-01-01), Friedt et al.
patent: 5322988 (1994-06-01), Russell et al.
patent: 5393699 (1995-02-01), Mikoshiba et al.
patent: 5405481 (1995-04-01), Licoppe et al.
patent: 5492734 (1996-02-01), Matsumoto et al.
patent: 5512328 (1996-04-01), Yoshimura et al.
patent: 5645897 (1997-07-01), Andra
patent: 5935454 (1999-08-01), Tada et al.
patent: 6007969 (1999-12-01), Hatakeyama et al.
patent: 6432317 (2002-08-01), Douglas et al.
patent: 6517401 (2003-02-01), Ogawa et al.
patent: 6630404 (2003-10-01), Babcock
patent: 6737286 (2004-05-01), Tao et al.
patent: 20040023519 (2004-02-01), Clark et al.
patent: 3725169 (1989-02-01), None
Placement of conjugated oligomers in an alkanethiol matrix by scanned probe microscope lithography; Chen et al.; Applied Physics Letters, vol. 75, No. 5; Aug. 2, 1999 pps 624-626.
Selective nanoscale growth of titanium on the Si(001) surface using an atomic hydrogen resist; Mitsui et al.; Journal of Applied Physics; vol. 86, No. 3; Aug. 1, 1999, pps 1676-1679.
Organo-germanium adsorption on a silicon surface by excimer-light irradiation; Ohshima; Applied Surface Science 107 (1996) 85-89, no month.
The adsorption of C6H5Cl on Si(111)7×7 studies by STM; Chen et al.; Surface Science 340 (1995) p. 224-230, no month.
“Laser-induced microscopic etching of GaAs and InP,” D. J. Ehrlich, R. M. Osgood, Jr., and T.F. Deutsch, 1980 American Institute of Physics; Appl. Phys. Lett 36(8), Apr. 15, 1980 pps.698-700.
“Conversion of SiCl Pair and Island Sites to SiCl Single Site upon Annealing of Ci/Si(111)-7×7 Surfaces”, Chun Yan, John A. Jensen and Andrew C. Kummel, 1995 American Chemical Society, J. Phys. Chem. vol. 99, No. 16, 1995, pps. 6084-6090, no month.
Anonymous, “Fabrication of Gold Nanostructures by Lithography with Self-Assembled Monolayers”,IBM Technical Disclosure Bulletin, vol. 39, No. 12, Dec. 1996, pp. 235-238, NY.
M. Balooch and W.J. Siekhaus, “Spontaneous and STM-Induced Reaction of XeF2 with Si(111)-7×7 at Low Coverage”,Nanotechnology7, 1996, no month pp. 356-359, IOP Publishing Ltd., UK.
Chen X. H. et al., “Photoetching of Si(111)-(7×7) Studied by STM”,Surface Science, Apr. 10, 1997, Elsevier, Netherlands, vol. 376, No. 1-3, pp. 77-86.
Chen X. H. et al., “Adsorption of C6H5Cl on Si(111) 7×7 Studied by STM”,Surface Science, Oct. 20, 1995, Elsevier Netherlands, vol. 340, No. 3, pp. 224-230.
Polanyi John C.
Rogers Duncan
Hill & Schumacher
Padgett Marianne
Polanyi John C.
Rogers Duncan
Schumacher Lynn C.
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