Method of molecular-scale pattern imprinting at surfaces

Details Method of molecular-scale pattern imprinting at surfaces Method of molecular-scale pattern imprinting at surfaces

1997-11-12

2000-12-05

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427553, 427552, 427534, 427555, 216 94, 438694, 438765, 438769, 438767, B05D 306

Patent

active

061563935

ABSTRACT:
A method for mask-free molecular or atomic patterning of surfaces of reactive solids is disclosed. A molecular-scale pattern of adsorbate molecules is used in place of the conventional macroscopic "mask". Molecules adsorb at surfaces in patterns, governed by the structure of the surface, the chemical nature of the adsorbate, and the adsorbate coverage at the surface. The surface is patterned and then marked or imprinted with the pattern by inducing localized chemical reaction between adsorbate molecules and the surface of the solid, resulting in an imprint being formed in the vicinity of the adsorbate molecules. In one aspect of the invention, photoinduced reaction of the patterned adsorbate leads to patterned photoreaction with the surface. The photoreaction can take the form of patterned photoattachment to the surface (patterned "writing" or "doping") or patterned photoremoval of atoms from the surface ("etching" which takes place in the initial reaction or through subsequent photoirradiation of the photopatterned surface). The adsorbate when irradiated with light, electrons or ions imprints a pattern on the substrate by localised reaction. The new method is exemplified by the case of a silicon substrate and chlorobenzene molecules which first adsorb in a pattern on a silicon crystal, and which when irradiated chlorinate the crystal in a similar pattern to that of the adsorbate. The method is suitable for the writing, doping or etching of molecular-scale features.

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