Method of measuring weak gas flows

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

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Details

C029S592100, C029S602100, C073S159000, C073S204110, C073S204170, C073S204260, C156S268000, C156S345420, C216S039000, C216S041000, C216S056000, C438S455000, C438S458000, C438S976000

Reexamination Certificate

active

07051418

ABSTRACT:
Firstly, a supporting frame is produced, whose opening is spanned by an auxiliary layer flush on one side. Following the production of microstructures, flat parts or membranes on the common plane defined by the auxiliary layer and the supporting frame, the auxiliary layer is removed, preferably by etching. In a preferred application, the self-supporting microstructures produced in accordance with the method of the invention are used as electrically heatable resistance grids in a device for measuring weak gas flows.

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“Flexible integration of nonsilicon microstructures on microelectronic circuits”; Muller, K.-D.; Bacher, W.; Heckele, M.; The Eleventh Annual International Workshop on Jan. 25-29, 1998; pp. :263-267.

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