Method of measuring length of measurement object article in...

Details Method of measuring length of measurement object article in... Method of measuring length of measurement object article in...

2011-04-12

2011-04-12

Vu, David (Department: 2829)

Semiconductor device manufacturing: process

With measuring or testing

Optical characteristic sensed

C356S237400

Reexamination Certificate

active

07923267

ABSTRACT:
A substrate comprises a substrate main body having a surface on which a measurement object article is to be formed. A reference scale is disposed on the surface of the substrate main body in the vicinity of a region of the surface where the measurement object article is to be formed. The reference scale has adjacent graduations spaced-apart a preselected distance from one another.

REFERENCES:
patent: 5156982 (1992-10-01), Nagoya
patent: 5721721 (1998-02-01), Yanagisawa et al.
patent: 5857258 (1999-01-01), Penzes et al.
patent: 6653214 (2003-11-01), Quach et al.
patent: 7595482 (2009-09-01), Nakayama
patent: 2002/0082789 (2002-06-01), Takizawa et al.
Patent Abstracts of Japan, publication No. 60-113940, publication date Jun. 20, 1985.

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