Method of measuring exposure condition and/or aberration of proj

Details Method of measuring exposure condition and/or aberration of proj Method of measuring exposure condition and/or aberration of proj

1995-08-29

1998-09-29

Angebranndt, Martin

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430 22, 355 77, 356372, 356401, H01L 21027

Patent

active

058144250

ABSTRACT:
A method of measuring an exposure condition for transfer of a pattern onto a photosensitive substrate or aberration of a projection optical system is disclosed, wherein the pattern is transferred onto the photosensitive substrate plural times in different exposure conditions, to form photosensitive patterns on the photosensitive substrate, and images of the photosensitive patterns are picked up. Frequency components of the photosensitive patterns are calculated from corresponding imagewise signals, and an optimum exposure condition for transfer of the pattern onto the photosensitive substrate is determined on the basis of the frequency components of the photosensitive patterns.

REFERENCES:
patent: 5124216 (1992-06-01), Giapis et al.
patent: 5434026 (1995-07-01), Takatsu et al.
patent: 5476738 (1995-12-01), Yuan

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