Method of measuring electric charge of semiconductor wafer

Details Method of measuring electric charge of semiconductor wafer Method of measuring electric charge of semiconductor wafer

1994-06-02

1995-12-12

Wieder, Kenneth A.

Electricity: measuring and testing

Fault detecting in electric circuits and of electric components

Of individual circuit component or element

324 715, 324766, 250307, G01R 3126

Patent

active

054753198

ABSTRACT:
Amounts of electric charges in a semiconductor wafer are measured by using a non-destructive measuring device. First and second flat-band voltages before and after a specific charging process are measured with a non-destructive C-V measurement device. A gap between a test electrode and a surface of a semiconductor wafer is also measured before and after performing the charging process. The electric charge accumulated proximate the surface of the semiconductor wafer is determined according to measured values of the gap and the flat-band voltages before and after performing the charging process.

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