Method of measuring defocusing and method of obtaining...

Details Method of measuring defocusing and method of obtaining... Method of measuring defocusing and method of obtaining...

2005-05-17

2005-05-17

Niebling, John F. (Department: 2812)

Optics: measuring and testing

By alignment in lateral direction

With light detector

C430S327000

Reexamination Certificate

active

06894782

ABSTRACT:
There is provided a method of measuring defocusing when a semiconductor wafer is exposed to light. With the method, a resist is exposed to light by deviating a focus of the light by a given distance in relation to the semiconductor wafer with the resist applied thereto, and after development of the resist, resist patterns for measurement are formed. Based on respective lengths of the resist patterns for measurement, defocusing in relation to the resist is found.

REFERENCES:
patent: 5693439 (1997-12-01), Tanaka et al.
patent: 5792596 (1998-08-01), Yasuzato et al.
patent: 5856053 (1999-01-01), Watanabe
patent: 6608681 (2003-08-01), Tanaka et al.
patent: WO 9510849 (1994-10-01), None

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