Method of measuring and controlling concentration of dopants...

Details Method of measuring and controlling concentration of dopants... Method of measuring and controlling concentration of dopants...

2006-05-16

2006-05-16

Glick, Edward J. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Fluorescence

C378S048000, C438S014000

Reexamination Certificate

active

07046760

ABSTRACT:
A method of measuring a concentration of dopants of an objective thin film includes measuring a concentration of dopants of a first wafer, forming the objective thin film on the first wafer to form a second wafer, measuring a concentration of dopants of the second wafer, and obtaining the concentration of dopants of the objective thin film by subtracting the concentration of dopants of the first wafer from the concentration of dopants of the second wafer. Therefore, the concentration of dopants of the objective thin film may be measured without the use of a criterion wafer, thereby reducing measuring time. Also, the concentration of dopants of the objective thin film may be easily controlled, and therefore promptly corrected if necessary.

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