Method of measuring AC residual image in a liquid crystal...

Details Method of measuring AC residual image in a liquid crystal... Method of measuring AC residual image in a liquid crystal...

2006-03-14

2006-03-14

Font, Frank G. (Department: 2883)

Liquid crystal cells, elements and systems

Nominal manufacturing methods or post manufacturing...

C324S701000

Reexamination Certificate

active

07012668

ABSTRACT:
A pair of substrates and a liquid crystal layer held between the pair of substrates are provided, at least one of the pair of substrates has plural electrodes for applying an electric field approximately parallel to the substrate to the liquid crystal layer, a protecting film for protecting at least one of the plural electrodes and oriented films or the electrodes, and an AC residual image of the oriented film is less than 8% to thereby enable high quality image display upon eliminating display defects caused by the AC residual image.

REFERENCES:
patent: 5264953 (1993-11-01), Hirai et al.
patent: 5350539 (1994-09-01), Mishina et al.
patent: 5600464 (1997-02-01), Ohe et al.
patent: 5831707 (1998-11-01), Ota et al.
patent: 5933202 (1999-08-01), Watanabe et al.
patent: 5936689 (1999-08-01), Saishu et al.
patent: 6066696 (2000-05-01), Yu et al.
patent: 6300994 (2001-10-01), Ohe et al.
patent: 6590411 (2003-07-01), Lee
patent: 10-39306 (1998-02-01), None

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