Method of measuring aberration in an optical imaging system

Details Method of measuring aberration in an optical imaging system Method of measuring aberration in an optical imaging system

2005-05-24

2005-05-24

Stafira, Michael P. (Department: 2877)

Optics: measuring and testing

Lens or reflective image former testing

Reexamination Certificate

active

06897947

ABSTRACT:
A method of determining aberration of an optical imaging system comprises measuring at least one parameter, such as position of best-focus and/or lateral position, of an image formed by the imaging system. This is repeated for a plurality of different illumination settings of the imaging system, and from these measurements at least one coefficient, representative of aberration of said imaging system, is calculated.

REFERENCES:
patent: 4943733 (1990-07-01), Mori et al.
patent: 5666206 (1997-09-01), Uchiyama
patent: 5680200 (1997-10-01), Sugaya et al.
patent: 5754299 (1998-05-01), Sugaya et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 5828455 (1998-10-01), Smith et al.
patent: 6078380 (2000-06-01), Taniguchi et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 6360012 (2002-03-01), Kreuzer
patent: 0 849 638 (1998-06-01), None
patent: 11237310 (1999-08-01), None
patent: 357262 (1999-05-01), None
patent: WO0031592 (2000-06-01), None
Impact of Lens Aberrations on Optical Lithography, T.A. Brunner, IBM Hopewell Junction, New York, Conference San Diego, CA Oct. 27-29, 1996.
Novel Aberration Monitor for Optical Lithography, P. Dirksen et al., Part of the SPIE Conference on Optical Microlithography XII, Santa Clara, CA, Mar. 1999, SPIE vol. 3679, pp. 77-86.
A Practical Technology Path to Sub-0.10 Micron Process Generations via Enhanced Optical Lithography, J. Fung Cheng et al., ASML MaskTools, Inc., 19thAnnjual Symposium on Photomask Technology, Monterey, CA, Sep. 15-17, 1999.
0.35 μm Lithography Using Off-Axis Illumination, Paul Luehrmann et al., SPIE vol. 1927, pp. 103-124, Optical/Laser Microlighography VI (1993)/103.
Optical Proximity Correction for Intermediate-Pitch Features Using Sub-Resolution Scattering Bars, J. Fung Cheng et al., J. Vac. Sci Technol. B 15(6), Nov./Dec. 1997, pp. 2426-2433.
Aberration Evaluation and Tolerancing of 193nm Lithographic Objective Lenses, Bruce W. Smith et al., SPIE vol. 3334/269, pp. 269-280, Optical Microlithography XI, Santa Clara, CA, Feb. 25-27, 1998.
Measurement of Lens Aberration Using an In-Situ Interferometer Reticle, Nigel Farrar et al., Advanced Reticle Symposium 1999, Optical Microlithography XIII, Santa Clara, CA, Mar. 1-3, 2000.

Affiliated with

Also associated with

Rating

Method of measuring aberration in an optical imaging system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of measuring aberration in an optical imaging system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of measuring aberration in an optical imaging system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3438133