Method of measuring a semiconductor device and a method of makin

Semiconductor device manufacturing: process – Making passive device – Stacked capacitor

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438255, 438964, H01L 2120

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058468706

ABSTRACT:
A method of measuring a semiconductor device in forming a capacitor by successively laminating a dielectric film and an opposed electrode above an upper face of a charge storing electrode a surface of which is formed in an irregular shaper, including the steps of forming the irregular shape of the charge storing electrode and measuring an area of the charge storing electrode which is to constitute an effective area of the capacitor by an atomic force microscope.

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