Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2007-10-30
2007-10-30
Culbert, Roberts (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C117S002000
Reexamination Certificate
active
11392863
ABSTRACT:
Li impurities are removed from a substrate of ZnO formed by a hydrothermal synthesis method. The surface layer of the substrate with Li impurities removed, is etched to planarize the substrate.
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Kato Hiroyuki
Sano Michihiro
Culbert Roberts
Stanley Electric Co. Ltd.
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