Method of manufacturing zinc chalcogenide semiconductor devices

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148DIG40, 148DIG41, 148DIG64, 148DIG110, 156613, 437 94, 437916, 437959, H01L 2120

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050266616

ABSTRACT:
A method of growing zinc chalcogenide in an atmosphere which contains the vapor of di-.pi.-cyclopentadienyl manganese or di-.pi.-alkyl cyclopentadienyl manganese that serves as a source of manganese. By growing zinc chalcogenide in the above atmosphere, there is obtained a manganese-doped zinc chalcogenide having a very high crystal quality, which is very suitable for the active layer in light emitting devices.

REFERENCES:
patent: 3880743 (1975-04-01), Lang
patent: 4193835 (1980-03-01), Inoue et al.
patent: 4523189 (1985-06-01), Takahara et al.
patent: 4547703 (1985-10-01), Fujita et al.
patent: 4613793 (1986-09-01), Panicker
patent: 4689522 (1987-08-01), Robertson
patent: 4717859 (1988-11-01), Sohn
Wilkinson et al., "On Manganese Cyclopentadienide . . .", J. Inorg. and Nucl. Chem., vol. 2, 1956, pp. 95-113.
Reynolds et al., "Some Methylcyclopentadienyl-Metal Compounds", J. Inorg. Nucl. Chem., vol. 9, 1959, pp. 86-92.
Mino et al., "Plasma-Assisted Metalorganic Chemical Vapor Deposition of ZnSe Films", J. Appl. Phys. 59(6), 15 Mar. 1986, pp. 2216-2221.
Yasuda et al., "Low Resistivity Al-Doped ZnS Grown by MOVPE", J. Crys. Growth, 77 (1986), pp. 485-489.
Cozak et al., "Direct Observation . . . Manganocene Derivatives . . . ", Can. J. Chem., vol. 64, 1986, pp. 71-75.
Hirabayashi et al., "ZnSiMn Electroluminescent Device Prepared by Metal-Organic Chemical Vapor Deposition", Jpn. J. Appl. Phys., vol. 25, No. 5, May 1986, pp. 711-713.

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