Method of manufacturing X-ray mask and heating apparatus

Details Method of manufacturing X-ray mask and heating apparatus Method of manufacturing X-ray mask and heating apparatus

1997-11-20

1999-09-14

Pelham, Joseph

Electric resistance heating devices

Heating devices

Radiant heater

219443, 430 5, G03F 900, H05B 320

Patent

active

059534923

ABSTRACT:
The X-ray mask manufactured according to the present invention can solve a problem that the thin film stress of the X-ray absorber cannot be made to be zero although the mean thin film stress throughout the X-ray absorber can be made to be zero. The thin film stress distribution over the X-ray absorber 4 after the X-ray absorber 4 has been formed on a silicon substrate 1 is measured, and then inputs of electric power to heaters 9a, 9b and 9c of a hot plate 8 are changed so as to heat the X-ray absorber 4 to temperatures according to a specified temperature distribution with which the thin film stress throughout the X-ray absorber can be made to be zero.

REFERENCES:
patent: 4873162 (1989-10-01), Yoshioka et al.
patent: 5132186 (1992-07-01), Takeuchi et al.
patent: 5464711 (1995-11-01), Mogab et al.
patent: 5496667 (1996-03-01), Yabe et al.
patent: 5541023 (1996-07-01), Kondo et al.
patent: 5677090 (1997-10-01), Marumoto et al.
T. Shoki, et. al., "Amorphous Structured Ta.sub.4 B Absorber on SiC Membrane for X-ray Mask", Digest of Papers Photomask, Japan '95, pp. 18-19 (1995) *Abstract and Summary Only.
Kenji Marumoto, et . al., "A Strategy For Highly Accurate X-ray Masks", Digest of Papers XEL'95, pp. M 6-2-1/2 (1995).

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