Method of manufacturing transparent electro-conductive film

Details Method of manufacturing transparent electro-conductive film Method of manufacturing transparent electro-conductive film

2006-12-26

2006-12-26

McNeil, Jennifer C. (Department: 1775)

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

C204S192100

Reexamination Certificate

active

07153544

ABSTRACT:
A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3or more.

REFERENCES:
patent: 5493102 (1996-02-01), Takase et al.
patent: 6495253 (2002-12-01), Koyama et al.
patent: 6617056 (2003-09-01), Hara et al.
patent: 06293956 (1994-10-01), None
patent: 10171599 (1998-06-01), None
patent: 2000351170 (2000-12-01), None
patent: WO 200016251 (2000-03-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing transparent electro-conductive film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing transparent electro-conductive film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing transparent electro-conductive film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3659100