Method of manufacturing thin-film transistor array substrate

Details Method of manufacturing thin-film transistor array substrate Method of manufacturing thin-film transistor array substrate

1997-02-26

1998-10-20

Niebling, John F.

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

438164, H01L 2100, H01L 2184

Patent

active

058245642

ABSTRACT:
In a thin film transistor array substrate, when a light shield pattern is formed in the space between a wiring group and a transparent electrode film, a trench which makes it possible to reduce bright spot defects is formed in an insulating film without revealing a light shielding film, by intentionally leaving a part of an a-Si film which is a semiconductor film constituting a thin film transistor. Accordingly, it is possible to manufacture a thin film transistor array substrate with less bright spot defects without increasing the number of manufacturing processes.

REFERENCES:
patent: 5008218 (1991-04-01), Kawachi et al.
patent: 5231039 (1993-07-01), Sakono et al.
patent: 5422293 (1995-06-01), Konya
patent: 5432108 (1995-07-01), Lee
patent: 5656526 (1997-08-01), Inada et al.

Affiliated with

Also associated with

Rating

Method of manufacturing thin-film transistor array substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing thin-film transistor array substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing thin-film transistor array substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-243664