Method of manufacturing thin-film electroluminescent display pan

Details Method of manufacturing thin-film electroluminescent display pan Method of manufacturing thin-film electroluminescent display pan

1987-03-09

1988-01-26

Pianalto, Bernard D.

Coating processes

Electrical product produced

Fluorescent or phosphorescent base coating

427 70, 4272552, 4272553, 4272557, B05D 506

Patent

active

047216310

ABSTRACT:
According to a method of this invention for manufacturing a thin-film electroluminescent display panel of the type having a pair of electrodes sandwiching a three-layer structure composed of a layer covered with dielectric layers on both sides, a silicon nitride or silicon oxynitride film is formed on a layer comprising ZnS by a plasma chemical vapor deposition method with a mixture of silicon and nitrogen gases or of silicon, nitrogen and N.sub.2 O gases. Alternatively, this film may be formed in a double-layer structure, the second layer being formed with a mixture of silicon and ammonia gases or of silicon, ammonia and N.sub.2 O gases. A dielectric layer thus formed by a method embodying this invention can satisfactorily cover the protrusions and impurities in the layer underneath and thin-film electroluminescent elements manufactured by this method have superior brightness characteristics.

REFERENCES:
patent: 4587171 (1986-05-01), Hamano

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