Plastic and nonmetallic article shaping or treating: processes – Gas or vapor deposition of article forming material onto...
Patent
1973-06-14
1976-03-09
Arnold, Donald J.
Plastic and nonmetallic article shaping or treating: processes
Gas or vapor deposition of article forming material onto...
264 83, 427 95, B29c 1304
Patent
active
039432181
ABSTRACT:
A method of producing shaped hollow semiconductor members, as of silicon or silicon carbide by depositing a select semiconductor material from a gaseous compound onto a heated graphite substrate which is first heat-treated above 1300.degree. C. in a flowing gas atmosphere, preferably a mixture of H.sub.2 and SiHCl.sub.3 so as to modify the surface characteristics of the substrate whereby the deposited semiconductor material does not interact with the substrate so that the substrate may be reused.
REFERENCES:
patent: 2925357 (1960-02-01), Kothen
patent: 3329527 (1967-07-01), Harris
patent: 3425878 (1969-02-01), Deisin et al.
patent: 3751539 (1973-08-01), Reuschel et al.
Dietze Wolfgang
Kasper Andreas
Arnold Donald J.
Parrish John
Siemens Aktiengesellschaft
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