Method of manufacturing semiconductor optical element

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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Details

C438S032000, C257S098000, C257SE21001

Reexamination Certificate

active

07611916

ABSTRACT:
A method of manufacturing a semiconductor optical element, includes successively stacking a first semiconductor layer of a first conductivity type, an active layer, and a second semiconductor layer of a second conductivity type; applying a resist to the second semiconductor layer and patterning the resist into stripes by photolithography; forming recesses in the second semiconductor layer and a waveguide ridge adjacent to the recesses by dry-etching the second semiconductor layer only partially through the second semiconductor layer, using the resist as a mask; forming an insulating film on the waveguide ridge and in the recesses while leaving the resist; removing the insulating film from the resist so that the resist is exposed while the insulating film in the recess is left; removing the resist exposed; and forming an electrode on the waveguide ridge after removing the resist.

REFERENCES:
patent: 5173447 (1992-12-01), Ijichi et al.
patent: 5658823 (1997-08-01), Yang
patent: 6171876 (2001-01-01), Yuang et al.
patent: 6278720 (2001-08-01), Lee et al.
patent: 6335216 (2002-01-01), Yoshida et al.
patent: 6642075 (2003-11-01), Takiguchi
patent: 6711191 (2004-03-01), Kozaki et al.
patent: 7263760 (2007-09-01), Peterson et al.
patent: 7421000 (2008-09-01), Taneya et al.
patent: 7447248 (2008-11-01), Miyajima et al.
patent: 7456039 (2008-11-01), Kawasaki et al.
patent: 2008/0090315 (2008-04-01), Abe et al.
patent: 1 005 124 (2000-05-01), None
patent: 04-147685 (1992-05-01), None
patent: 04-329688 (1992-11-01), None
patent: 09-036389 (1997-02-01), None
patent: 2000-012970 (2000-01-01), None
patent: 2000-022261 (2000-01-01), None
patent: 2000-114664 (2000-04-01), None
patent: 2000-164987 (2000-06-01), None
patent: 2000-315838 (2000-11-01), None
patent: 2000-340880 (2000-12-01), None
patent: 2002-171028 (2002-06-01), None
patent: 2002-208753 (2002-07-01), None
patent: 2002-335043 (2002-11-01), None
patent: 2003-046193 (2003-02-01), None
patent: 2003-142769 (2003-05-01), None
patent: 2004-253545 (2004-09-01), None
patent: WO 03/085790 (2003-10-01), None

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