Method of manufacturing semiconductor optical element

Details Method of manufacturing semiconductor optical element Method of manufacturing semiconductor optical element

2009-03-04

2009-11-03

Smith, Zandra (Department: 2822)

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

C438S032000, C257S098000, C257SE21001

Reexamination Certificate

active

07611916

ABSTRACT:
A method of manufacturing a semiconductor optical element, includes successively stacking a first semiconductor layer of a first conductivity type, an active layer, and a second semiconductor layer of a second conductivity type; applying a resist to the second semiconductor layer and patterning the resist into stripes by photolithography; forming recesses in the second semiconductor layer and a waveguide ridge adjacent to the recesses by dry-etching the second semiconductor layer only partially through the second semiconductor layer, using the resist as a mask; forming an insulating film on the waveguide ridge and in the recesses while leaving the resist; removing the insulating film from the resist so that the resist is exposed while the insulating film in the recess is left; removing the resist exposed; and forming an electrode on the waveguide ridge after removing the resist.

REFERENCES:
patent: 5173447 (1992-12-01), Ijichi et al.
patent: 5658823 (1997-08-01), Yang
patent: 6171876 (2001-01-01), Yuang et al.
patent: 6278720 (2001-08-01), Lee et al.
patent: 6335216 (2002-01-01), Yoshida et al.
patent: 6642075 (2003-11-01), Takiguchi
patent: 6711191 (2004-03-01), Kozaki et al.
patent: 7263760 (2007-09-01), Peterson et al.
patent: 7421000 (2008-09-01), Taneya et al.
patent: 7447248 (2008-11-01), Miyajima et al.
patent: 7456039 (2008-11-01), Kawasaki et al.
patent: 2008/0090315 (2008-04-01), Abe et al.
patent: 1 005 124 (2000-05-01), None
patent: 04-147685 (1992-05-01), None
patent: 04-329688 (1992-11-01), None
patent: 09-036389 (1997-02-01), None
patent: 2000-012970 (2000-01-01), None
patent: 2000-022261 (2000-01-01), None
patent: 2000-114664 (2000-04-01), None
patent: 2000-164987 (2000-06-01), None
patent: 2000-315838 (2000-11-01), None
patent: 2000-340880 (2000-12-01), None
patent: 2002-171028 (2002-06-01), None
patent: 2002-208753 (2002-07-01), None
patent: 2002-335043 (2002-11-01), None
patent: 2003-046193 (2003-02-01), None
patent: 2003-142769 (2003-05-01), None
patent: 2004-253545 (2004-09-01), None
patent: WO 03/085790 (2003-10-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing semiconductor optical element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing semiconductor optical element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing semiconductor optical element will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4093219