Method of manufacturing semiconductor integrated circuit...

Details Method of manufacturing semiconductor integrated circuit... Method of manufacturing semiconductor integrated circuit...

2007-02-06

2007-02-06

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

C430S005000, C430S311000

Reexamination Certificate

active

10770413

ABSTRACT:
To alleviate the absolute value control accuracy of phases in a mask having a groove shifter structure, transfer regions formed at different planar positions on the same plane of the same mask are subjected to a multiple exposure by scanning exposure. Although identical mask patterns are formed over the transfer regions respective groove shifters provided to these mask patterns are arranged opposite from each other.

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