Method of manufacturing semiconductor element

Semiconductor device manufacturing: process – Semiconductor substrate dicing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S462000, C438S046000, C438S113000, C257SE21499

Reexamination Certificate

active

08062959

ABSTRACT:
A step of forming a first auxiliary groove in a semiconductor element structure provided on a semiconductor substrate, a step of forming a second auxiliary groove in the semiconductor element structure, and a step of dividing the semiconductor substrate and the semiconductor element structure in a direction along the first auxiliary groove and the second auxiliary groove are provided, and in the dividing direction, a plurality of the second auxiliary grooves are arranged spaced apart from each other, and at least two first auxiliary grooves are arranged spaced apart from each other between at least a pair of adjacent second auxiliary grooves, and in the dividing step, a separation region interposed between the two first auxiliary grooves is divided, so as to improve such accuracy and suppress the problems such as a damage of the end surface due to cleavage of the substrate.

REFERENCES:
patent: 7183136 (2007-02-01), Hashimura et al.
patent: 7397834 (2008-07-01), Kozaki et al.
patent: 7649923 (2010-01-01), Sakamoto et al.
patent: 2007/0264802 (2007-11-01), Sakamoto et al.
patent: 9-232676 (1996-02-01), None
patent: 3395631 (1999-01-01), None
patent: 3449201 (1999-06-01), None
patent: 11-177137 (1999-07-01), None
patent: 2000-058972 (2000-02-01), None
patent: 3727187 (2000-03-01), None
patent: 2004-031526 (2004-01-01), None
patent: 2004-165226 (2004-06-01), None
patent: 2004-165227 (2004-06-01), None
patent: 2004-228290 (2004-08-01), None
patent: 2004-259846 (2004-09-01), None
patent: 2004-327879 (2004-11-01), None
patent: 2005-159278 (2005-06-01), None
patent: 2006-165407 (2006-06-01), None
patent: 2007-329459 (2007-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing semiconductor element does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing semiconductor element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing semiconductor element will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4274683

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.