Method of manufacturing semiconductor devices and apparatus ther

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250423R, 250427, H01J 4904

Patent

active

060842415

ABSTRACT:
A method of manufacturing a semiconductor device includes creating ions in a chamber (201), using the ions to generate sputtered material from a target (241, 242) in the chamber (201), creating other ions from the sputtered material in the chamber (201), extracting the other ions out of the chamber (201), and implanting the other ions into the wafer (111).

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