Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Patent
1998-06-01
2000-07-04
Nguyen, Kiet T.
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
250423R, 250427, H01J 4904
Patent
active
060842415
ABSTRACT:
A method of manufacturing a semiconductor device includes creating ions in a chamber (201), using the ions to generate sputtered material from a target (241, 242) in the chamber (201), creating other ions from the sputtered material in the chamber (201), extracting the other ions out of the chamber (201), and implanting the other ions into the wafer (111).
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Huffman A. Kate
Motorola Inc.
Nguyen Kiet T.
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