Radiation imagery chemistry: process – composition – or product th – Plural exposure steps
Patent
1995-05-18
1996-10-22
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Plural exposure steps
430312, 430396, G03F 720, G03F 722
Patent
active
055675751
ABSTRACT:
When semiconductor devices having patterns with different repetition counts of repetition patterns are to be manufactured, a mask having a unit pattern for forming the repetition patterns is used, and photolithographic patterning processes in which the numbers of times of exposure are different from each other are used. For this reason, the number of masks can be reduced, and the masks can be formed at low cost. In addition, risk in manufacturing the semiconductor devices is decreased.
REFERENCES:
patent: 4869998 (1989-09-01), Eccles
patent: 5132195 (1992-07-01), Pool
patent: 5302491 (1994-04-01), Akylas
patent: 5308741 (1994-05-01), Kemp
Duda Kathleen
Sony Corporation
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