Method of manufacturing semiconductor devices

Radiation imagery chemistry: process – composition – or product th – Plural exposure steps

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430312, 430396, G03F 720, G03F 722

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active

055675751

ABSTRACT:
When semiconductor devices having patterns with different repetition counts of repetition patterns are to be manufactured, a mask having a unit pattern for forming the repetition patterns is used, and photolithographic patterning processes in which the numbers of times of exposure are different from each other are used. For this reason, the number of masks can be reduced, and the masks can be formed at low cost. In addition, risk in manufacturing the semiconductor devices is decreased.

REFERENCES:
patent: 4869998 (1989-09-01), Eccles
patent: 5132195 (1992-07-01), Pool
patent: 5302491 (1994-04-01), Akylas
patent: 5308741 (1994-05-01), Kemp

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