Method of manufacturing semiconductor device with improved...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Making plural separate devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S125000, C438S126000

Reexamination Certificate

active

08039310

ABSTRACT:
A semiconductor method comprises a method for making a device comprising: a base; a semiconductor chip provided on the base which includes a first main surface20aon which a plurality of electrode pads is provided, a surface protecting film provided on the first main surface, a second main surface which opposes the first main surface, and a plurality of side surfaces between the surface of the surface protecting film and the second main surface; an insulating extension portion formed so as to surround the side surfaces of the semiconductor chip; a plurality of wiring patterns electrically connected to the electrode pads, respectively and extended from the electrode pads to the surface of the extension portion; a sealing portion formed on the wiring patterns such that a part of each of the wiring patterns is exposed; and a plurality of external terminals provided on the wiring patterns in a region including the upper side of the extension portion.

REFERENCES:
patent: 4989063 (1991-01-01), Kolesar, Jr.
patent: 5870289 (1999-02-01), Tokuda et al.
patent: 6013948 (2000-01-01), Akram et al.
patent: 6154366 (2000-11-01), Ma et al.
patent: 6220764 (2001-04-01), Kato et al.
patent: 6222259 (2001-04-01), Park et al.
patent: 6268648 (2001-07-01), Fukutomi et al.
patent: 6271469 (2001-08-01), Ma et al.
patent: 6320267 (2001-11-01), Yukawa et al.
patent: 6423570 (2002-07-01), Ma et al.
patent: 6455920 (2002-09-01), Fukasawa et al.
patent: 6709898 (2004-03-01), Ma et al.
patent: 7294529 (2007-11-01), Tuominen
patent: 2002/0192867 (2002-12-01), Nishiyama
patent: 2003/0122244 (2003-07-01), Lin et al.
patent: 2003/0230804 (2003-12-01), Kouno et al.
patent: 2004/0046254 (2004-03-01), Lin et al.
patent: 2004/0099955 (2004-05-01), Shizuno
patent: 2004/0130022 (2004-07-01), Shizuno
patent: 11-251493 (1999-09-01), None
patent: 2000-124354 (2000-04-01), None
patent: 2000-208556 (2000-07-01), None
patent: 2000-277682 (2000-10-01), None
patent: 2001-308116 (2001-11-01), None
patent: 2002-016173 (2002-01-01), None
patent: 2002-231854 (2002-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing semiconductor device with improved... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing semiconductor device with improved..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing semiconductor device with improved... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4262180

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.