Method of manufacturing semiconductor device and display device

Details Method of manufacturing semiconductor device and display device Method of manufacturing semiconductor device and display device

1998-10-12

2000-12-26

Elms, Richard

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

438151, 438152, 438166, H01L 2100

Patent

active

061658103

ABSTRACT:
A semiconductor device manufacturing method is provided for manufacturing semiconductor elements on a substrate through RTA (Rapid Thermal Annealing) using a lamp. A substrate is sequentially and preliminarily heated using a plurality of preliminary heating plates arranged for stepwise temperature rise before annealing the substrate using the RTA technique. After the heating process, a cooling step may be performed to the substrate to cool it stepwise. The annealing process can prevent a breakage in a substrate due to thermal stress, while the throughput increases.

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patent: 5661114 (1997-08-01), Otto et al.
patent: 5695557 (1997-12-01), Yamagata et al.
patent: 5716207 (1998-02-01), Mishina et al.
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patent: 5771110 (1998-06-01), Hirano et al.
patent: 5994275 (1999-11-01), Otto et al.

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