Method of manufacturing semiconductor device

Details Method of manufacturing semiconductor device Method of manufacturing semiconductor device

1997-10-06

2000-07-25

Angebranndt, Martin

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 430 22, 2504911, 356401, H01L 2308

Patent

active

060935111

ABSTRACT:
The present invention relates to a method of manufacturing a semiconductor device including a step of exposing a resist by use of an exposure mask. An object of the present invention is to facilitate a level adjustment of the reticle and thus automatically determine an optimum focus. The present invention has steps of providing a reticle with a plurality of inspection patterns, which are positioned within a dicing line area around a semiconductor integrated circuit forming area on the reticle, and of which each has a size such that their transferred patterns are changed in shape according to an amount of deviation in focus, and exposing a resist by use of the reticle.

REFERENCES:
patent: 3742229 (1973-06-01), Smith et al.
patent: 4669866 (1987-06-01), Phillips
patent: 4794648 (1988-12-01), Ayata et al.

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