Method of manufacturing semiconductor device

Semiconductor device manufacturing: process – Bonding of plural semiconductor substrates – Subsequent separation into plural bodies

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21568

Reexamination Certificate

active

07745310

ABSTRACT:
To provide a method of manufacturing a semiconductor device in which the space between semiconductor films transferred at plural locations is narrowed. A first bonding substrate having first projections is attached to a base substrate. Then, the first bonding substrate is separated at the first projections so that first semiconductor films are formed over the base substrate. Next, a second bonding substrate having second projections is attached to the base substrate so that the second projections are placed in regions different from regions where the first semiconductor films are formed. Subsequently, the second bonding substrate is separated at the second projections so that second semiconductor films are formed over the base substrate. In the second bonding substrate, the width of each second projection in a direction (a depth direction) perpendicular to the second bonding substrate is larger than the film thickness of each first semiconductor film formed first.

REFERENCES:
patent: 6380046 (2002-04-01), Yamazaki
patent: 6485993 (2002-11-01), Trezza et al.
patent: 7199024 (2007-04-01), Yamazaki
patent: 2002/0109144 (2002-08-01), Yamazaki
patent: 2007/0173000 (2007-07-01), Yamazaki
patent: 2008/0061301 (2008-03-01), Yamazaki
patent: 2008/0067529 (2008-03-01), Yamazaki
patent: 2008/0067597 (2008-03-01), Yamazaki
patent: 2008/0083953 (2008-04-01), Yamazaki
patent: 2008/0318367 (2008-12-01), Shimomura et al.
patent: 2009/0004821 (2009-01-01), Shimomura et al.
patent: 2009/0004823 (2009-01-01), Shimomura et al.
patent: 2000-012864 (2000-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of manufacturing semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing semiconductor device will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4247070

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.