Method of manufacturing semiconductor apparatus and method...

Metal fusion bonding – Process – With pretreating other than heating or cooling of work part...

Reexamination Certificate

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Reexamination Certificate

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07735717

ABSTRACT:
A method of manufacturing a semiconductor apparatus including a process of applying viscous liquid. The method applies viscous liquid onto a principal surface of a substrate, coats the viscous liquid closely with flexible coating material having a higher bonding strength with molecules of the viscous liquid than an intermolecular bonding strength of molecules of the viscous liquid, and then strips away the coating material together with part of the viscous liquid.

REFERENCES:
patent: 4934582 (1990-06-01), Bertram et al.
patent: 5482736 (1996-01-01), Glenn et al.
patent: 5928722 (1999-07-01), Soyama et al.
patent: 6890384 (2005-05-01), Moden et al.
patent: 2003/0035886 (2003-02-01), Yamuni et al.
patent: 06-124954 (1994-05-01), None
patent: 11-186329 (1999-07-01), None
patent: 2000-216186 (2000-08-01), None
patent: 2002-151536 (2002-05-01), None

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