Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Metallic housing or support
Reexamination Certificate
2007-03-23
2010-10-26
Richards, N Drew (Department: 2895)
Semiconductor device manufacturing: process
Packaging or treatment of packaged semiconductor
Metallic housing or support
C257SE21517
Reexamination Certificate
active
07820489
ABSTRACT:
A method of manufacturing a semiconductor apparatus includes forming an electrode on a semiconductor device, forming a conductive bump on the electrode, placing an external wire on the conductive bump, and laser-welding the external wire and the conductive bump to establish electrical connection.
REFERENCES:
patent: 4845335 (1989-07-01), Andrews et al.
patent: 4978835 (1990-12-01), Luijtjes et al.
patent: 5164566 (1992-11-01), Spletter et al.
patent: 5892270 (1999-04-01), Pan
patent: 6903450 (2005-06-01), Funato et al.
patent: 7138673 (2006-11-01), Tanaka
patent: 2002/0130114 (2002-09-01), Evers
patent: 2003/0183605 (2003-10-01), Vivet
patent: 2005/0194423 (2005-09-01), Okita
patent: 2005/0212101 (2005-09-01), Funato et al.
patent: 1531044 (2004-09-01), None
patent: 1 333 481 (2003-08-01), None
patent: 61-053737 (1986-03-01), None
patent: 8-64634 (1996-06-01), None
patent: 2001-68502 (2001-03-01), None
patent: 2002-313851 (2002-10-01), None
patent: 2002-314018 (2002-10-01), None
patent: WO 91/00617 (1991-01-01), None
European Patent Office Search Report on Application No. 07007105.5 mailed Jul. 27, 2010; 6 pages.
Takahashi Kouhei
Tanaka Takekazu
Foley & Lardner LLP
NEC Electronics Corporation
Richards N Drew
Withers Grant S
LandOfFree
Method of manufacturing semiconductor apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of manufacturing semiconductor apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing semiconductor apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4223728