Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1977-07-12
1978-12-26
Rutledge, L. Dewayne
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148 15, 156653, 357 23, H01L 23306, H01L 21265
Patent
active
041314972
ABSTRACT:
A method of forming extremely small impurity regions within other impurity regions without the need for providing critical masks. In the preferred embodiment this is achieved by forming an undercut band within masking layers atop a substrate to define a first impurity region, such as the base region of a bipolar transistor. After this region is formed by the introduction of impurities, the undercut is filled-in by a chemical vapor deposition process. A blocking mask may then be used for the formation of the second impurity region, in this case the emitter, within the first region. The window of the second region is defined by the filled-in band, thereby insuring a selected distance between the peripheries of said first and second impurity regions. The same mask may also be used to form other self-aligned regions with the first region.
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Antipov, "Filling Air Pockets . . . Si.sub.3 N.sub.4 ", IBM -TDB, 18 (1975) 732.
Feng Bai-Cwo
Feng George C.
Galvin Thomas F.
International Business Machines - Corporation
Roy Upendra
Rutledge L. Dewayne
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