Method of manufacturing schottky gate transistor utilizing align

Details Method of manufacturing schottky gate transistor utilizing align Method of manufacturing schottky gate transistor utilizing align

2000-03-10

2000-10-31

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430312, 430315, 430328, 438167, 438172, 438574, G03F 900

Patent

active

061399957

ABSTRACT:
The specification describes a photolithography process using multiple exposures to form z-dimension patterns. Multiple exposures at different thickness levels are made using photomasks aligned with a latent image of alignment marks formed during the first exposure. The latent image is visible to the alignment system of commercial steppers.

REFERENCES:
patent: 5496669 (1996-03-01), Pforr et al.
patent: 6042975 (2000-03-01), Burm et al.

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