Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation
Reexamination Certificate
2006-01-27
2008-12-02
Lindsay, Jr., Walter (Department: 2812)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
Responsive to electromagnetic radiation
C438S048000, C438S551000, C438S552000, C257SE21415
Reexamination Certificate
active
07459334
ABSTRACT:
A method of manufacturing a quartz crystal vibrating piece is provided. Etching masks of different sizes are each arranged on respective front and rear surfaces of a quartz crystal wafer such that the etching mask on one of the surfaces (e.g., the rear surface) is larger than the other etching mask. The quartz crystal wafer is etched using the etching masks so that a projection is formed on a side of the quartz crystal wafer due to the difference in size of the etching masks, and is overetched to remove the projection.
REFERENCES:
patent: 5998233 (1999-12-01), Sugitani et al.
patent: 6332567 (2001-12-01), Ikegami et al.
Patent Abstracts of Japan, publication No. 10-270967, publication date Oct. 9, 1998.
Adams & Wilks
Lindsay, Jr. Walter
Mustapha Abdul Fattah
Seiko Instruments Inc.
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