Etching a substrate: processes – Forming or treating electrical conductor article
Patent
1994-04-15
1995-07-04
Powell, William
Etching a substrate: processes
Forming or treating electrical conductor article
216 83, 216 91, 216100, 428209, B44C 122, C23F 102
Patent
active
054297095
ABSTRACT:
An etching process of a conductive layer in manufacturing polyimide multilayer printed wiring boards comprises the steps of dipping in an alkali aqueous solution for patterning the conductive layer, dipping in an acid aqueous solution for neutralizing the alkali residue, and washing with water thereby washing off the alkali residue. A curing process for each of polyimide layers is controlled so as to obtain a polyimide conversion ratio ranging between 60% and 100% after an initial curing process, and to obtain a polyimide conversion ratio close to 100% after formation of an uppermost polyimide layer.
REFERENCES:
patent: 5322593 (1994-06-01), Hasegawa et al.
patent: 5378310 (1995-01-01), Satoh et al.
Ishizuki Yoshikatsu
Mizutani Daisuke
Fujitsu Limited
Powell William
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