Method of manufacturing planar lightwave circuits

Details Method of manufacturing planar lightwave circuits Method of manufacturing planar lightwave circuits

1997-12-16

2000-07-04

Utech, Benjamin

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

438710, 438715, 438717, 438723, 156643, 156647, H01L 21306

Patent

active

060838434

ABSTRACT:
The present invention is an improved method of pigtailing of high-density Wavelength Division Multiplex (WDM) components, achieved by etching silicon V-grooves for locating the fibres after completion of the PLC device fabrication processes. This avoids the need for etching or pre-patterning of the V-grooves on substrates before device fabrication, and hence avoids any of the waveguide to fibre alignment problems that have been found in the methods of the prior art.

REFERENCES:
patent: 5217568 (1993-06-01), Tessier et al.
patent: 5342478 (1994-08-01), Welbourn
patent: 5471552 (1995-11-01), Wuu et al.

Affiliated with

Also associated with

Rating

Method of manufacturing planar lightwave circuits does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing planar lightwave circuits, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing planar lightwave circuits will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1486084