Method of manufacturing piezoelectric thin film device and...

Wave transmission lines and networks – Coupling networks – Electromechanical filter

Reexamination Certificate

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C310S324000

Reexamination Certificate

active

10538137

ABSTRACT:
Method of producing a piezoelectric thin film device comprises a step of forming an insulating layer (12) capable of being etched by a specific chemical substance on the upper surface of a substrate (11); a step of forming a sacrificial layer (13) made of a substance having a higher etching rate by the specific chemical substance than the insulating layer on a partial region of the insulating layer; a step of forming a lower electrode (15) on a region including the sacrificial layer; a step of forming the piezoelectric thin film (16) on a region including a part of the lower electrode; a step of forming an upper electrode (17) on a region including a part of the piezoelectric thin film; a step of forming via hole (18), which penetrates the piezoelectric thin film and lower electrode, so as to expose a part of the sacrificial layer; and a step of forming a space (20) for oscillation by etching both the sacrificial layer and the insulating layer with the same specific chemical substance by introducing the specific chemical substance through the via hole.

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patent: 6842088 (2005-01-01), Yamada et al.
patent: 2002/0190814 (2002-12-01), Yamada et al.
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patent: 2002-372974 (2002-12-01), None
patent: 2003-032060 (2003-01-01), None
patent: 2003-136499 (2003-05-01), None
patent: WO 98/16956 (1998-04-01), None
patent: WO 02/093549 (2002-11-01), None

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