Method of manufacturing photonic crystal

Details Method of manufacturing photonic crystal Method of manufacturing photonic crystal

2005-08-02

2005-08-02

Hiteshew, Felisa (Department: 1765)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Forming from vapor or gaseous state

With decomposition of a precursor

C117S089000, C117S095000

Reexamination Certificate

active

06923861

ABSTRACT:
A photonic crystal manufacturing method exposes two or more silver halide particle layers that contain silver halide particles which have different spectral sensitivity characteristics for each of the silver halide particle layers to light having wavelengths corresponding to the respective different spectral sensitivity characteristics, and then develops the exposed silver halide particle layers to form therein a periodic structure with an aggregate of developed silver. Photonic crystals can be manufactured with relative ease in a relatively short period of time. This method assures continued high accuracy.

REFERENCES:
patent: 6767676 (2004-07-01), Nagao
patent: 2001-272566 (2001-10-01), None

Affiliated with

Also associated with

Rating

Method of manufacturing photonic crystal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing photonic crystal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing photonic crystal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3521670