Method of manufacturing photomask

Details Method of manufacturing photomask Method of manufacturing photomask

1991-10-16

1993-10-19

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430320, G03F 900

Patent

active

052544184

ABSTRACT:
A method of manufacturing a photomask, according to the present invention, comprises the step of entirely forming an intermediate shifter on a transparent substrate, light shielding layers and a phase shifter such that the thickness of the intermediate shifter successively varies. In edge portion of the phase shifter, thus, the phase of light is continuosly shifted from 0 to 180 degree. As in result, light intensity at the edge portion does not decrease to zero but has a relatively large value, preventing a bridge to be formed.

REFERENCES:
patent: 5045417 (1991-09-01), Okamoto
patent: 5100503 (1992-03-01), Allman et al.

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