Method of manufacturing photoluminescing semiconductor material

Details Method of manufacturing photoluminescing semiconductor material Method of manufacturing photoluminescing semiconductor material

1995-12-01

1997-01-28

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427596, B05D 306

Patent

active

055976212

ABSTRACT:
A method for the manufacture of a photoluminescing layer on a normally non-photoluminescing semiconductor substrate, such as a porous silicon layer created on a silicon substrate, by treating the surface of the substrate with a relatively high energy, pulsed laser beam.

REFERENCES:
patent: 5397429 (1995-03-01), Hummel et al.
patent: 5421958 (1995-06-01), Fathaner et al.
Laiho et al, Phys. Rev. B, vol. 51, No. 20, 15 May 1995, pp. 14774-14777.
Movtchan et al, Thin Solid Films 255(1995) pp. 286-289.

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