Method of manufacturing optical low-pass filter

Details Method of manufacturing optical low-pass filter Method of manufacturing optical low-pass filter

1994-05-24

1996-08-27

Sikes, William L.

Optical: systems and elements

Holographic system or element

Using a hologram as an optical element

359569, 348291, G02F 113, G02B 2746, H04N 9083

Patent

active

055506631

ABSTRACT:
A mother layer made of a thermoplastic resin is formed on the substrate. The mother layer is etched to make a grating layer. The etching process is stopped so that an offset layer remains under the grating layer. The grating layer and the offset layer are baked to be molten. The baking process is stopped when a phase grating defined by a surface having a sinusoidal shape is formed.

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patent: 3728014 (1973-04-01), Rosenblum
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patent: 4472735 (1984-09-01), Shinozaki et al.
patent: 4998800 (1991-03-01), Nishida et al.
patent: 5046827 (1991-09-01), Frost et al.
patent: 5204765 (1993-04-01), Mitsui et al.
Fujisawa et al., "Optical Low-Pass Filter Using the Organic Optical Material", ITEJ Technical Report, vol. 14, No. 53, Sep. 1990, pp. 7-12.
O. Wada, "Ion-Beam Etching of InP and Its Application to the Fabrication of High Radiance InGaAsP/Inp Light Emitting Diodes", J. electrochem. Soc. Solid-State Science and Technology, vol. 131, No. Oct. 1984 pp. 2373-2380.

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