Method of manufacturing multilayer thin film pattern and...

Details Method of manufacturing multilayer thin film pattern and... Method of manufacturing multilayer thin film pattern and...

2011-04-26

2011-04-26

Vinh, Lan (Department: 1713)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S706000, C438S725000, C216S041000, C430S310000

Reexamination Certificate

active

07932183

ABSTRACT:
A method of manufacturing a multilayer thin film pattern includes forming a metal film over a substrate, forming a second thin film over the metal film, forming a resist pattern over the second thin film, etching the second thin film using the resist pattern as a mask, transforming the resist pattern using an organic solvent or a RELACS agent to cover an edge face of the etched second thin film and etching the metal film while the edge face of the second thin film is covered with the resist pattern.

REFERENCES:
patent: 6008065 (1999-12-01), Lee et al.
patent: 6195140 (2001-02-01), Kubo et al.
patent: 6933989 (2005-08-01), Oke et al.
patent: 6977219 (2005-12-01), Frost et al.
patent: 7338911 (2008-03-01), Kido
patent: 2004/0004686 (2004-01-01), Ogawa et al.
patent: 2005/0164459 (2005-07-01), Young
patent: 11-101992 (1999-04-01), None
patent: 11-345974 (1999-12-01), None
patent: 2002-110631 (2002-04-01), None
patent: 2003-255378 (2003-09-01), None
patent: 2004-294804 (2004-10-01), None
patent: 2005-215277 (2005-08-01), None
patent: 2005-275323 (2005-10-01), None
patent: 2006-41265 (2006-02-01), None
U.S. Appl. No. 12/432,320, filed Apr. 29, 2009, Miyamoto, et al.

Affiliated with

Also associated with

Rating

Method of manufacturing multilayer thin film pattern and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of manufacturing multilayer thin film pattern and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of manufacturing multilayer thin film pattern and... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2719802